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12" Poromeric Polishing Pad (PSA) for final polishing - EQ-PP-12PSA-PC

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Item Number: EQ-PP-12PSA-PC

12" POROMERIC POLISHING PAD ( PSA)

Poromeric pad is made of napped none-woven materials with uniform pore structure and wall strength. It is excellent for applications such as,

  • Final polishing of LiNbO3 and Sapphire wafers.
  • Final polishing in CMP for semiconductors and oxide crystals.
  • EPI polishing for all single crystal substrates.
  • Final polishing for metallographic sample.
  • PSA backing, fit with any 12" polishing machine.
 
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MS&T 2012, Booth# 536, Oct.9-10, 2012, Pittsburgh, PA, USA

Nanotech 2012, Booth# 712, June 19-20, 2012, Santa Clara, California
ECS 221st, Booth#208, May 7-9, 2012, Seattle,WA, USA
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Notices
1. The price listed on line is valid for US market  and who pay by credit card only. There will be extra cost for shipping and handling. The price is different from country to country
2. We may add extra cost for paper order and net 30 term due to extra labor cost
3. The price is subject to change without notice