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2" RF Plasma Magnetron Sputtering Coater for Non-Conductive Thin Films - VTC-2RF

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Item Number: VTC-2RF
Transported by LTL Freight (Truck)


VTC-2RF is a compact 2" single head RF Plasma magnetron sputtering system coating non-metallic, mainly oxide thin film. It integrates all components into one-floor stand cabinet, including RF power source, quartz vacuum chamber, vacuum pump, recirculation water chiller and film thickness monitor etc. It is an excellent and cost effective coater for coating thin film of non-conductive material in R&D.

Input Power
  • 220 VAC, 50/60Hz, single phase
  • 800 W  (including pump)
  • If the voltage is 110 VAC, a 1000 W transformer is required, please click the left picture to order
Source Power
  • One 13.5 MHz, 300 W RF Generator with automatic matching function is built in cabinet and connected to 2" sputtering head (click picture left to see detailed specs)

Magnetron Sputtering Head

  • One 2" Magnetron Sputtering Heads with water cooling jackets are included and inserted into quartz chamber via quick clamp (Click Pic. left 1 to see detailed specs)
  • One shutter is built on the flange (manually operated)
  • One 16 L/min digitally controlled recirculation water chiller is installed on bottom cabinet for cooling magnetron sputtering heads (Click Pic. right 3 for detail specs)
  • 1" sputtering head is replaceable and optional at extra cost (Click Pic. right 2 to order)
  • 148 cm RF cable is replaceable with extra cost (Click Pic. right 1 to order)

Sputtering Target

Vacuum Chamber

  • Vacuum Chamber: 160 mm OD x 150 mm ID x  250 mm Height. made of high purity quartz
  • Sealing Flange: 165 mm Dia. made of Aluminum with high-temperature silicone O-ring
  • Stainless steel mesh cover is included for 100% shielding RF radiation from chamber
  • Vacuum level: 1.0E-2 Torr with included dual stage mechanical pump and 1.0E-5 Torr with optional turbo pump
  • Optional: Stainless steel chamber is available at extra cost

Sample Holder

  • Sample holder is rotatable and heat-able made of a ceramic heater with stainless steel cover
  • The sample holder size: 50 mm Dia. for 2" wafer max
  • Rotation speed is adjustable: 1 - 10 rpm for uniform coating
  • The holder temperature is adjustable from RT to 400°C Max with accuracy +/- 1.0 °C via digital temperature controller.
  • 800- 1000ºC heating sample holder is available upon request upon request. ( pls click pic left to see details )
Vacuum Pump Station
  • KF25 Vacuum port is built in for connecting to a vacuum pump. Please click picture left to view mechanical pump 
  • Vacuum level: 1.0E-2 Torr with included dual stage mechanical pump
  • 1.0E-5 Torr with optional turbo pump
  • Precision quartz thickness sensor is optional, which can be built into the chamber to monitor coating thickness with accuracy 0.10 Å. LED Display Unit outside chamber can:
    • Input material to be coated according to the included database
    • Display total thickness coated and coating speed
    • 5 pcs quartz sensors (consumable) are included 
    • Water cooling is required
  • This coater can be modified into three 1" sputtering sources with DC power supply easily
  • For DC magnetron  sputtering, suggest you use turbo pump
  • Test the flexibility of the thin film / coated electrode with EQ-MBT-12-LD mandrel bending tester.

Overall Dimensions

  • 650 mm L x 650 mm W x 1630 mm H             

                  (Click the picture to see details)

Net Weight

  • 70 kg


  • CE approval
  • MET Certification (UL 1450) is available upon request at extra cost, please contact our sales representative for quote 

Warranty & Compliance

  • One years limited warranty with lifetime support

Operation Instruction


Application Notes

  • This compact 1" RF magnetron sputtering coater is designed for coating oxide thin films on oxide single crystal substrates, which usually does not need high vacuum set-up
  • Please use > 5N purity Ar gas for plasma sputtering
  • For the best film-substrate adhesion strength, please clean the substrate surface before coating:
    • Ultrasonic cleaning (Click Pic #1 to order) with the following sequential baths - (1) acetone, (2) isopropyl alcohol - to remove oil and grease. Blow dry the substrate with N2, then hot bake in vacuum to remove absorbed moisture
    • Plasma cleaning (Click Pic #2 to order) may be needed for surface roughening, surface chemical bonds activation, or additional contamination removal
    • A thin buffer layer (~5 nm), such as Cr, Ti, Mo, Ta, could be applied to improve adhesion of metals and alloys
  • For best performance, the non-conductive targets must be installed with a copper backing plate. Please refer to the instruction video below (#3) for target bonding
  • MTI supplies single crystal substrate from A to Z (Click Pic #4 to order) 
  • MTI RF Plasma Sputtering Coaters have successfully coated ZnO on Al2O3 substrate at 500 °C (XRD profile in Pic #5)
  • HIGH VOLTAGE! Sputtering heads connect to high voltage. For safety, the operator must shutdown the RF generator before sample loading and target changing operations
  • DO NOT use tap water in water chiller. Use coolant, DI water, distilled water, or anti-corrosive additives with water
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1. Prices listed online are valid for US market and whom pay by credit card only. There will be extra charges for shipping & handling. Price various from country to country.
2. We may add extra charges for paper order and net30 terms due to extra labor cost.
3. The prices listed are subject to change without notice.