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Atomospheric Plasma Jet-Flow system ( Plasma Pen) for surface Treatment - GSL1100X-PJF-LD

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Item Number: GSL1100X-PJF-LD


GSL1100X-PJF is a compact Atmospheric Plasma Jet-Flow ( so called  Plasma Beam , Plasma Pen) system for surface Treatment, which consist of RF generator, flexible gas delivery pipe and plasma beam head. The plasma jet flow can activate and clean material surface rapidly at low temperature without vacuum, such as single crystal wafer, optical component, plastics etc. It is excellent tool for cleaning wafer surface before epitaxial or optical fiber befor welding to obtain higher quality. This device also may be used for studying Atomospheric pressure CVD.

Input Power
Output Frequency 20-23 kHz
Plasma Beam head

one plasma Beam heads is included
round head:10-12mm

  • High speed surface treatment with simple and safe operation
  • Neither vaccum  nor chamber required with versatile plasma chemistry
  • Handheld or in-line processing at low cost
  • light weight and compact size

Input Gas Pressure and Working Gases
  • 40 PSI min.
  • Air, N2, Ar, He or any mixed gas ( no flammable and explosive gases)
Plasma working Pressure 7- 10 PSI

Working Environment
  • Temperature: < 42°C
  •  Himunity: : ≤ 40℃RH
  •  No flammable gas
Overall Dimensions 380 (W) ×210 (H) ×500 (D) mm
Net Weight 10 kg

Warranty & Certificate
  • One year limited with lifetime support
  • CE certified
Operation Manual
Application Notes
  • This Atomospheric Plasma Jet-Flow system  is excellent to clean platic ,polymer and oxide substrate surface before coating
  • This device also may be used for studying Atomospheric pressure CVD.
  • You may click picture below to order our automatic scan system to achieve clean or coating for 10"x10" area

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