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Compact 1100ºC Tube Furnace with Solid Precursor Sublimator for CVD Growth of 2D Layers of TMDs - OTF-1200X-4-NW-UL

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Item Number: OTF-1200X-4-NW-UL
Transported by LTL Freight (Truck)


Upgrade to Eurotherm Temp. Controller
OTF-1200X-4-NW-UL is a compact 1100°C CVD tube furnace with precursor sublimator attachment. Totally four-channel gas inlets are built on the sublimator which allows feedings of various gases to carry the source vapor into the main heater for further decomposition and depostion. The sample holder fixture mounted on the right flange is slidable for easy sample loading/unloading. Such a system configuration is suitable for growing a wide range of transitional metal dichacogenides (such as MoSe2, MoS2...) and wide bandgap semiconductors (such as h-BN) layers on substrate up to 3" diameter. 
  • CVD growth of 2D layer of TMDs and wide bandgap semicondutor materials, please click underline to review the report for more detailed processing requirements.
Furnace and Preheater

  • Compact CVD furnace system is modified from OTF-1200X-100 single zone tube furnace:
    • Water cooling flange on left-side between the heater and furnace is used for pre-heated gas input and sealing
  • Four channel gas inlet ( 1/8" Dia tube and tube fitting) are built in on the left side flange
  • One small heater is attached to the left side flange of the furnace to preheat input gas, liquid,  or evaporate solid chemical, which will be then delivered to CVD furnace:
    Please click picture left for more details:
    • 1.2''O.D x 6''L SS tube as heating chamber
    • 600ºC Max. working temperature
    • Flange on left side is for gas sealing and input
Rated Voltage Single Phase, 220V AC, 50/60 Hz, AWG 8# Power cord is included (without plug)
Power consumption Max. 3600 W (20 A breaker required)

Heating Zone
  • CVD Furnace:  440 mm
  • Constant temperature zone: 100 mm 
  • Gas Heater:     150mm

Working Temperature
  • CVD Furnace:
    • Max heating temperature: 1100°C ( < 2 hour )
    • Continuous working temperature: 200~1000°C
    • Max heating & cooling rate: 20°C/min
  • Heater:
    • Continuous working temperature: RT~600°C
    • Max heating & cooling rate: 20°C/min
Temperature Control

  • CVD Furnace and Heater (separate temp control):
    • Digital controllers with PID/self-tuning functions and 30 segments programmable
    • Thermocouple:  K type thermocouples, which feed through the right side flange and control furnace temperature.
    • Control accuracy: +/- 1°C
    • RS485 Communications Port


and Gas Sealing & Flange
  • CVD Furnace:
    • Right flange:
      • Water cooling to prevent sealing o-ring from melting (water cooler is not included, please click water chiller to order)
      • KF25 vacuum fitting (to vacuum pump, please click to order pumpvacuum hose, valve and sealing gasket)
      • Slidable for customer to easily and fast push/pull in/out sample
      • One quartz wafer holder ( 3" Dia. ) is included and the flange with heating radiation block to hold nanowire growth substrate
      • An anti-corrosive capacitance diaphragm gauge is included
    • Left flange (between CVD Furnace and Heater) with four 1/8'' Swagelok fittings for 1/8'' tube:
      • Two separate 1/8'' fitting on the flange for independently and directly delivering any gas into the CVD furnace 
      • One 1/8'' fitting for delivering heated gas from heater to CVD furnace
      • One 1/4'' fitting for bypassing the gas (without heating) to the CVD furnace (inside the CVD furnace, the gas tube is merged with heated gas pipe by a T fitting)
      • Note: How gas pipe assembled in the CVD furnace through above 1/8'' fitting:
        • One 1/4'' quartz tube deliver the heated gas from heater (also the bypass gas by a T fitting)
        • Two 1/4'' quartz tube delivery extra gas via the two separate 1/8'' fitting on the big furnace left flange
        • These three 1/4'' quartz tubes inside CVD furnace is in parallel and vertically 1'' higher than sample holder
        •  These three 1/4'' quartz tubes can be easily removed to clean or replaced once get stuck or corroded
  • Heater:
    • Left flange: one 1/8'' gas fitting to deliver gas to heater for pre-heating and then to CVD furnace 
    • On the right side to CVD furnace with necessary thermal block material to minimize the temperature gradient at the interface between heater and CVD furnace
    • Furnace Chamber Installation
    • 2 1/4" pipe adapter are installed on each flange
Net weight

  • Standard:    62"L X 18"W X 23"H
  • Maximum:   80"L X 18"W X 32"H  (Lid open and right-side flange slided out)
  • One year limited warranty for electrical parts. ( Consumable parts such as processing tubes, o-rings and etc are not covered by the warranty)
  • You may order replacement quartz tube here:  EQ-QZTube-SF
Laptop, software & WiFi Control (Optional)
  • Brand new laptop with Microsoft Window 10 and Microsoft Office 2013 (30 days free trial) for immediate use.
  • Labview Based Temperature Control System (EQ-MTS01) enables user to edit temperature profile, manage heat-treatment recipe, record and plot data for MTI furnaces.
  • A wireless remote control provides up to 300 meters operating range.
  • Above features are available upon request at an extra cost (up to $1,000). Please contact us for more information.
  • Note: 
    The software is only compatible with MTI’s Yudian Temperature Controller


  • CE Certified
  • All electric components ( >24V) are UL / MET / CSA certified
  • The furnace is ready to pass TUV(UL61010)  or CSA certification at extra cost. ( please click marks below to learn details )

Click here to learn the installation of a gas regulator
  • The tube furnaces with quartz tube are designed for using under vacuum and low pressure <0.2 bars / 3 psi / 0.02 Mpa
  • Attention: A two-stage pressure regulator must be installed on the gas cylinder to limit the pressure to below 3 PSI for safe operation. Click here to learn the installation of a gas regulator.
  • Vacuum limit definition for all quartz tube furnaces: * Vacuum pressures may only be safely used up to 1000°C 
  • The flow rate for gasses should be limited to<200 SCCM (or 200ml/min) for reducing thermal shocks to the tube
Operation Instructions

Application Note
  • CVD growth of 2D layer of TMDs and wide bandgap semicondutor materials
  • After CVD, the graphene must be transferred from the metal catalyst to another substrate for most applications. By using the graphene transfer tape, the residue can be low.

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