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Nickel <111>-oriented Polycrystalline Film ( 100nm) Coated SiO2/Si Wafer - 4" dia.(100) P/Boron ,SSP, R:1-20 ohm.cm


In stock
Item Number: Ni-SO/Si-Ba101D05C1

Quantity Discounts

QuantityAmount
100 to 499USD$473.10

Film Specification

  • Nickel Film Thickness: 100nm
  • Film Crystallinity:   (111) - oriented polycrystals

Silicon Wafer Specifications:

  • Conductive type:         Si   P- type, B-doped
  • Resistivity:                  1-20  ohm-cm
  • Size:                          4" diameter +/- 0.5 mm  x 0.525 +/- 0.025 mm th
  • SiO2 Thichness:         300 nm
  • Orientation:                (100) +/- 0.5o
  • Polish:                        One  sides  polished
  • Surface roughness:     Prime
  • Packing:                      Vacuum packed on a 4" single wafer carrier
  • Optional:  you may need tool below to handle the wafer ( click picture to order 

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