Browse Categories
Search

3 Heads Compact 1" RF Plasma Magnetron Sputtering Coater, with DC Magnetron Sputtering Option - VTC-3RF


Transported by LTL Freight (Truck)

Product Options

Sputtering Source:

Personalization

VTC-3RF is a three head 1" RF Plasma magnetron sputtering system designed for non-metallic thin film coating, mainly for multilayer oxide thin films. It is the most cost-effective coater for researching in the new generation of oxide thin films. DC magnetron sputtering option is available upon request for metallic film deposition, enabling three DC, one RF / two DC, and two RF / one DC sputtering head configurations.


SPECIFICATIONS
Input Power
  • Single phase 220 VAC, 50 / 60 Hz
  • 1000 W (including vacuum pump and water chiller)
  • If the voltage is 110 V, a 1500 W transformer can be ordered at MTI (Click the picture to the left for detail)
Power Source


  
  • 13.5 MHz, 100 W RF generator with manual matching is included and connected to the sputtering heads
  • Load range: 0 – 80 Ω adjustable. Tuning range: -200j – 200j adjustable
  • The rotatable switch can activate one sputtering head at a time. Sputtering heads can be switched “in the plasma” (no breaking of vacuum and plasma during a multilayer process)
  • With a DC power supply, the coater can be easily modified into 1” DC sputtering sources for metallic film deposition, enabling three DC, one RF / two DC, and two RF / one DC sputtering head configurations (Bottom left picture. Please select from the Product Options)
  • Optional 300 W auto-match RF generator is available at extra cost (Click the bottom right picture for detail information)
500 W DC Power Supply 300 W RF Power Suppl
   

Magnetron Sputtering Head

  • Three 1" magnetron sputtering heads with water cooling jackets (Click Pic #1 for detail information) are included and inserted into quartz chamber via quick clamps
  • RF cable replacement can be purchased at MTI (Click Pic #2 for detail information)
  • One manually operated shutter is built on the flange (See Pic #3)    
  • One 10 L/min digitally controlled recirculating water chiller is included for cooling sputtering heads (Click Pic #4 for detail information)
    1 2 3 4

Sputtering Target

  • Target size requirement: 1" diameter x 1/8" thickness max
  • Sputtering distance range: 50 – 80 mm adjustable
  • Sputtering angle range: 0 – 25° adjustable 
  • 1" diameter Cu target and Al2O3 target are included for demo testing
  • Various oxide 1” sputtering targets are available upon request at extra cost
  • For target bonding, 1 mm and 2 mm copper backing plates are included. Silver epoxy (Pic #1) and extra copper backing plates (Pic #2) can be ordered at MTI
    1 2
Vacuum Chamber

  • Vacuum chamber:  256 mm OD x 238 mm ID x  276 mm Height, made of high purity quartz
  • Sealing flange: 274 mm Dia. made of Aluminum with high-temperature silicone O-ring
  • Stainless steel shield cage is included for 100% shielding of RF radiation from the chamber
  • Max vacuum level: 1.0E-5 Torr with optional turbo pump and chamber baking 

Sample Holder

  • Sample holder is a rotatable and heatable stage made of ceramic heater with stainless steel cover
  • Sample holder size: 50 mm Dia. for. 2" wafer max (See picture below)
  • Rotation speed: 1 - 10 rpm adjustable for uniform coating
  • The holder temperature is adjustable from RT to 600 °C max (5 min max at 600 °C; 2 hr max at 500 °C) with accuracy +/- 1.0 °C via a digital temperature controller
               

Vacuum Pump 
 
  • KF40 vacuum port is built in for connecting to a vacuum pump.
  • Vacuum level: 1.0E-2 Torr with included dual stage mechanical pump (Click the picture on the left)
  • 1.0E-5 Torr with optional turbo pump  (Click the picture below)
           
Optional
  • Precision quartz thickness sensor is optional (Click Pic #1 for detail information). It can be built into the chamber to monitor coating thickness with accuracy 0.1 Å (water cooling required) 
    • Easy USB connection to PC for remote thickness and coating speed monitoring
    • 5 pcs quartz sensors (consumable) are included 
  • Remote PC control of the temperature controller is optional (Click Pic #2 for detail information)
    • Easy USB connection to PC for remote temperature control
    • Temperature control software is included. The module is compatible with LabView
  • For DC magnetron sputtering, turbo pump is recommended (Pic #3)
  • Reactive sputtering with N2 or O2 is available with optional gas mixing control station (Click Pic #4 for detail information)
    1 2 3 4

Size

  • 540 mm L x 540 mm W x 1000 mm H

Net Weight

  • 60 kg

Compliance

  • CE approval
  • MET Certification (UL 1450) is available upon request at extra cost, please contact our sales representative for quote. 
               

Warranty 

  • One years limited warranty with lifetime support 

Operation Instruction

                   

Application Notes
  

  • This compact 1" RF magnetron sputtering coater is designed for coating oxide thin films on oxide single crystal substrates, which usually does not need high vacuum set-up
  • A two-stage pressure regulator (not included) should be installed on the gas cylinder to limit the output pressure of gas to below 0.02 MPa for safe usage. Please use > 5N purity Ar gas for plasma sputtering
  • For the best film-substrate adhesion strength, please clean the substrate surface before coating:
    • Ultrasonic cleaning (Click Pic #1 to order) with the following sequential baths - (1) acetone, (2) isopropyl alcohol - to remove oil and grease. Blow dry the substrate with N2, then hot bake in vacuum to remove absorbed moisture
    • Plasma cleaning (Click Pic #2 to order) may be needed for surface roughening, surface chemical bonds activation, or additional contamination removal
    • A thin buffer layer (~5 nm), such as Cr, Ti, Mo, Ta, could be applied to improve adhesion of metals and alloys
  • For best performance, the non-conductive targets must be installed with a copper backing plate. Please refer to the instruction video below (#3) for target bonding
  • MTI supplies single crystal substrate from A to Z (Click Pic #4 to order) 
  • MTI RF Plasma Sputtering Coaters have successfully coated ZnO on Al2O3 substrate at 500 °C (XRD profile in Pic #5)
  • Test the flexibility of the thin film/coated electrode with EQ-MBT-12-LD mandrel bending tester. (Click Pic.6 for detail.)
  • HIGH VOLTAGE! Sputtering heads connect to high voltage. For safety, the operator must shut down the RF generator before sample loading and target changing operations
  • DO NOT use tap water in water chiller. Use coolant, DI water, distilled water, or anti-corrosive additives with water
    1 2 3 4 5 6

Related Products

Shopping Cart
Your cart is empty.
Please clear the browsing history before ordering the product. Otherwise, availability and price are not guaranteed.
Mailing Lists
MTI sponsors MTI-UCSD Battery Fabrication Lab:
MTI-UCSD Battery Fabrication Lab Opening


MTI sponsors MRS and ECS Postdoctoral Award:

MTI Sponsors the Postdoctoral Awards

Upcoming Shows:
2017 MRS Fall Meeting and Exhibit Nov 26 - Dec 1 Boston MA Booth 901

BPS 2018 62nd Annual Meeting Biophysical Society Feb 17-21 San Francisco CA

2018 SME Annual Conference & Expo Feb 25 - 28 Minneapolis, MN Booth 701


Recent Attended Shows:
2017 MMM Conference Nov 6-10 Pittsburgh, PA

Zhejiang University MSE Visiting Oct 31 Richmond CA


MS&T 2017 Oct 8 - 12 Pittsburgh, PA

232nd ECS Meeting Oct 1 - 5 National Harbor, MD

Click here to see our past conferences

 

Notices
1. Prices listed online are valid for US market and whom pay by credit card only. There will be extra charges for shipping & handling. Price various from country to country.
2. We may add extra charges for paper order and net30 terms due to extra labor cost.
3. The prices listed are subject to change without notice.