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Home > What's new in MTI > PECVD Split Tube Furnace (2''-3.14'' OD) with 4 Channels Gas Delivery & Vacuum System (Max.1200C 10E-3 torr) - OTF-1200X-50-4CLV-PE
PECVD Split Tube Furnace (2''-3.14'' OD) with 4 Channels Gas Delivery & Vacuum System (Max.1200C 10E-3 torr) - OTF-1200X-50-4CLV-PE
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In stock
Item Number: OTF-1200X-50-4CLV-PE
4 -6 weeks to delivery for QC
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OTF-1200X-50-4CLV-PE is a CE certified compact PE-CVD (Plasma Enhanced Chemical Vapor Deposition) tube furnace system, which consists of 500W RF plasma source, 2" - 3.14" O.D optional split tube furnace, 4 channels precision mass flow meter with gas mixing tank, and high quality mechanical pump.
The PE-CVD furnace is an ideal and affordable tool to deposit thin films or grow nano-wire from a gas state (vapor) to a solid state, and benefits:
Lower temperature processing compared to conventional CVD.
Film stress can be controlled by high/low frequency mixing techniques.
Control over stoichiometry via process conditions.
Offers a wide range of material deposition, including SiOx, SiNx, SiOxNy and Amorphous silicon (a-Si:H) deposition.
Specifications:
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Split Tube furnace
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1200oC Max. working temperature for < 60 minutes
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1100oC Max for continuous heating
- 30 segments programmable precision digital temperature controller.
- 440 mm length single heating zone and 150 mm length constant temperate zone
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High purity quartz tube optional from ( click optional bar to choose )
- One pair of vacuum sealed flange with valves.
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Input power: 208 – 240V AC input, single phase at max. 4KW
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Plasma RF Power supply
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Output Power: 5 -500W adjustable with ± 1% stability.
RF frequency: 13.56 MHz ±0.005% stability.
Reflection Power: 200W max.
Matching: Automatic
RF Output Port: 50 Ω, N-type, female
Noise: <50 dB.
Cooling: Air cooling.
Power : 208-240VAC, 50/60Hz
Note: This RF power supply can accept 50 - 80 mm Max quartz tube by changing flange
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Vacuum Pump and valve
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Optional Oiless Pump
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Please order the oiless pump for zero contamination:
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Mass Flow meters
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- Four precision mass flow meters (0.02% accuracy) with digital display are installed on the bottom case to control gas flow rate automatically.
- MFC 1: Gas flow range from 0~100 sccm
- MFC 2&3: Control range from 0~200 sccm
- MFC 4: Control range from 0~500 sccm
- One gas mixing tank is installed on bottom case with liquid release valve.
- 4 stainless steel needle valves is installed on left side of bottom case to control 4
type gases mixing manually.
- Gas inlet fitting: four 1/4NPS.
- Gas outlet fitting: four 1/4NPS.
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Optional
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You may choose quart tube of 80 mm diameter at extra cost ( $1200 )
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Overall dimensions
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- Furnace: 550 x 380 x 520 mm .
- 2 Bottom
Mobile case together: 1200 x 1200 x 1200mm.
- Net weight: 220 Lbs.
- Shipping weight: 350lbs.
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Warranty & Certificate
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Note:
MTI reserves right to modify PECVD design at any time without notice, but promise quality meet and excess the specifications above
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Sale Price: USD$10,995.00
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Sale Price: USD$11,995.00
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MS&T 2012, Booth# 536, Oct.9-10, 2012, Pittsburgh, PA, USA
 Nanotech 2012, Booth# 712, June 19-20, 2012, Santa Clara, California
 ECS 221st, Booth#208, May 7-9, 2012, Seattle,WA, USA
 SVC TechCon2012, Booth# 739, May 1- 2, 2012, Santa Clara, California
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Notices
1. The price listed on line is valid for US market and who pay by credit card only. There will be extra cost for shipping and handling. The price is different from country to country
2. We may add extra cost for paper order and net 30 term due to extra labor cost
3. The price is subject to change without notice
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