Plasma cleaning involves the removal of impurities and contaminants from surfaces through the use of an energetic plasma created from gaseous species. Gasses such as argon and oxygen, as well as mixtures such as air and hydrogen/nitrogen. The plasma is created by using high-frequency voltages (typically kHz to >MHz) to ionize the low-pressure gas (typically around 1/1000 atmospheric pressure), although atmospheric pressure plasmas are now also common.
UV Ozone Cleaner has proven to be highly effective for non-acidic, dry, non-destructive atomic cleaning and removal of organic contaminants using intense 185 nm and 254 nm ultraviolet light. In the presence of oxygen, the 185 line produces Ozone and while the 254 line excites organic molecules on the surface. This combination drives the rapid destruction and decimation of organic contaminants.