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YAlO3 is excellent substrate for HTS film and II-V nitride , as well as many oxide films due to its chemcial stability and lattice matching.
Structure
Lattice (A)
Melting Point
Density g/cc
Dielectric Constant
Thermo-Expans x10-6/K
Max. Xtl Size
Orthor.
a=5.176 b=7.355
c= 5.307
1870 0C
4.88
16-20
2-10
30d x 50mm
XRD diffraction ange: 20°54' <110> and (41°44') <220>
MS&T 2012, Booth# 536, Oct.9-10, 2012, Pittsburgh, PA, USA