3 Rotary Target Plasma Sputtering Coater w. Substrate Heater (500 °C) Including 3 Targets - VTC-16-3HD-LD

VTC-16-3HD-LD is a CE certified compact three rotary target plasma sputtering coater with a touch screen digital controller, and a substrate heater capable of heating up to 500 °C. It can coat 1- 3 types of metallic materials to sample with the diameter up to 50 mm. Three sputtering targets: gold, silver, copper are included for immediate use. (Updated on Aug, 21th, 2015: add shield / without pump)

Input Power	Single phase 220 VAC, 50 / 60Hz 700 W (including vacuum pump) For using 110 VAC, we will include a transformer for you. Please select the voltage in the Product Options
Output Power	1600 VDC 40 mA max
Vacuum Chamber	Vacuum chamber: 150 mm ID x 165mm OD x 150 mm H, made of high purity quartz Sealing flange made of stainless steel with flat O-ring Please click here to order the Quartz Chamber replacement.
Sample Stage with Heater	Stage size: 50 mm Dia. Sputtering distance range: 25 – 40 mm adjustable Rotatable stage with three sputtering positions (controlled by the touch screen) Substrate heater is built-in with a maximum heating temperature of 500 °C PID temperature controller with +/- 1 °C accuracy is integrated into the touch screen
Control Panel	6” color touch screen with PLC integration for easy operation Vacuum gauge, sputtering current meter, and substrate temperature control are integrated to the touch screen panel Adjustment knobs on the front panel for gas intake and sputtering current control Sputtering position, sputtering timer, and process logging are accessible from the touch screen
Shield	Stainless steel shield cage is included for extra protection
Sputtering Targets	Target size requirements: 47 mm Dia. x 2.5 mm max Three targets are included in the standard package for immediate use: Au target, 47 mm Dia. x 0.12 mm Ag target, 47 mm Dia. x 0.5 mm Cu target, 47 mm Dia. x 2.5 mm Please click here to see recommended coating parameter for Au & Cu Target Various targets are available to order at MTI
Vacuum Pump (Optional)	Built-in KF25 vacuum port for connecting to a vacuum pump (Pic #1) Vacuum pump with KF25 connector is required, but not included. User may choose A double stage mechanical vacuum pump for vacuum up to 1.0E-2 Torr (Click Pic #2 to order) Or a turbo pump for vacuum up to 1.0E-5 Torr  (Click Pic #3 to order) Vacuum pump can be plugged into the power outlet on the left of coater for automatic control
Dimensions	440 mm L × 330 mm W × 455 mm H
Net Weight	50 kg
Operation Instructions
Compliance	CE approval MET Certification (UL 1450) is available upon request at extra cost, please contact our sales representative for quote
Warranty	One year limited with lifetime support
Application Notes	For the best film-substrate adhesion strength, please clean the substrate surface before coating: Ultrasonic cleaning (Click the picture below to order) with the following sequential baths - (1) acetone, (2) isopropyl alcohol - to remove oil and grease. Blow dry the substrate with N2, then hot bake in vacuum to remove absorbed moisture Plasma cleaning (Click the picture below to order) may be needed for surface roughening, surface chemical bonds activation, or additional contamination removal A thin buffer layer (~5 nm), such as Cr, Ti, Mo, Ta, could be applied to improve adhesion of metals and alloys A two-stage pressure regulator (not included) should be installed on the gas cylinder to limit the output pressure of gas to below 0.02 MPa for safe usage. Please use > 5N purity Ar gas for plasma sputtering The sputtering coater can be placed into an Ar and N2 gas glove box for coating HIGH VOLTAGE! Sputtering heads connect to high voltage. For safety, the operator must shut down the equipment before sample loading and target changing operations This model is not suitable for coating light metallic material such as Al, Mg, Zn, Ni, etc. due to low energy. Please consider our magnetron sputtering coater or thermal evaporation coater. Click pictures below for detail                                                                                                      Ultrasonic Cleaner    Plasma Cleaner    Magnetron Sputtering  Thermal  Evaporation