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0.7 L Plasma Cleaner with Digital Vacuum Gauge, 3"Dx 6.5"L Quartz Chamber, 13.56 Mhz - EQ-PCE-3

Transported by LTL Freight (Truck)

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EQ-PCE-3  ( upgraded from EQ-PDC-32G-LD ) is a 3" compact plasma cleaner with digital vacuum sensor and display, and as well as the hinged door.  which is designed for cleaning and removing nanoscale organic contamination on wafer up to 2" with various gas easily. The rate of organic removal is about 10 nm/min Maximum at high RF power. It is an excellent tool to pre-clean single crystal substrate before coating to the achieve a better film quality. If you do not have any experience for plasma surface cleaning, please refer to the articles as the follows:
  • McIntire, Theresa M., S. Rachelle Smalley, John T. Newberg, A. Scott Lea, John C. Hemminger, Barbara J. Finlayson-Pitts. "Substrate Changes Associated with the Chemistry of Self-Assembled Monolayers on Silicon." Langmuir (2006) 22(13): 5617-5624.
  • Sumner, Ann Louise, Erik J. Menke, Yael Dubowski, John T. Newberg, Reginald M. Penner, John C. Hemminger, Lisa M. Wingen, Theo Brauers, Barbara J. Finlayson-Pitts. "The Nature of Water on Surfaces of Laboratory Systems and Implications for Heterogeneous Chemistry in the Troposphere." Phys. Chem. Chem. Phys. (2004) 6: 604-613.
  • Mennicke, Ulrike, Tim Salditt. "Preparation of Solid-Supported Lipid Bilayers by Spin-Coating." Langmuir (2002) 18: 8172-8177.

  • Cleaning and removing nanoscale organic contamination on wafer up to 2" with various gas easily.
  • Excellent tool to pre-clean single crystal substrate before coating to the achieve a better film quality
  • Hinged type door for easy sample loading.
  • 3" Diameter Quartz Chamber excellent for cleaning 2" wafer with option Quartz Boat
  • Removable Quartz tube inside Quartz Chamber easy to clean and replacement.

RF Power
RF power (High voltage & high frequency current applied on the coil) is adjustable at three levels:
Low Setting 680V  10 mA  7 W
Medium Setting 700V  15 mA  11 W
High Setting 720V  25 mA  18 W
Plasma Chamber

  • 3" diameter x 6.5" length quartz chamber
  • 700 mL capacity
  • High purity quartz has a longer service life than glass.
Vacuum Gauge & Display
  • A Stinger gauge is installed on the hinged door.
  • 1/8" NPT needle valve to qualitatively control gas flow and chamber pressure.
  • 1/8" NPT 3-way valve to quickly switch from bleeding in gas, isolating the chamber, and venting.
Vacuum Pump 
Input Power
  • Cleaner AC 208 - 240V, 50/60Hz, single phase
  • Vacuum pump AC 208 - 240V, 50/60Hz, single phase (Cleaner controls the power line of pump.)
  • For operation under AC110V, you may order additional (1500W transformer)

Working Gases
  • Many inert gases can be chosen for plasma cleanings, such as N2, Ar, Air, and Mixed gas depended on what kind of material will be treated. ( Please select the two-channel gas mixer from model selection)
  • <5% H2 mixed inert gas can be used
  • No flammable gas shall be used for the plasma cleaner.
Overall dimension         
 Net Weight of Plasma Cleaner 40 Lbs
Shipping Weight & Dimensions 100 lbs

Optional Accessories

  • You may order a Removable Quartz tube(80 O.D, 205 L mm) at extra cost.
  • Combinations of PCE-3 plasma cleaner with Two Channel Gas Mixer will be a solution for introducing up to two (2) process gases. Order plasma cleaner with the two-channel gas mixer from product options or Click the picture below for Two-Channel Gas Mixer.
  • You may order quartz wafer carrier to clean 2" wafer
  • CE approval
  • NRTL certification is NOT available temporary.
Warranty One-year limited warranty with lifetime support ( no warranty for Pyrex glass chamber )
Operation Demo Video

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3. The prices listed are subject to change without notice.