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Nickel<111> Film (100nm) Coated SiO2/Si Wafer -(100) P/Boron ,5 x 5 x 0.5mmSSP, R:1-20 ohm.cm - Ni-SO/Si-050505S1


In stock
Item Number: FilmNic100SO300onSiBa05050525C1

Nickel Film

  •          Nickel Film Thickness: 100nm
  • Film Crystallinity:   (111) - oriented polycrystals

Silicon Wafer Specifications:

  • Conductive type:          Si   P- type, B-doped
  • Resistivity:                  1-20  ohm-cm
  • Size:                          5x5x0.5mm
  • SiO2 Thichness:          300 nm
  • Orientation:                 (100) +/- 0.5o
  • Polish:                        One  sides  polished
  • Surface roughness:      Prime
  • Packing:                      Vacuum packed on a 4" single wafer carrier
  • Optional:  you may need tool below to handle the wafer ( click picture to order )



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