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950ºC Max CSS and RTP Furnace With Rotating Holder for 12" Wafer - OTF-1200X-RTP-II-CSS-300
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Item Number: OTF-1200X-RTP-II-CSS-300
Transported by LTL Freight (Truck)
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OTF-1200X-RTP-II-5-R is an advanced rapid thermal processing (RTP) furnace, which is designed for CSS (Close Spaced Sublimation) film coating up to 12" wafer at the working temperature of 950°C Max. The furnace is heated by two groups of halogen heaters (Top and Bottom) separately with max. 20ºC/s heating rate. The top sample holder is rotatable to achieve a uniform coating. It is an excellent tool to research new generation thin films for solar cells, such as CdTe, Sulfide, and Perovskite solar cells, and also can be used for annealing 12" semiconductor wafers.
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