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1200C Tube Furnace with Internal Travel Mechanism For HPCVD - OTF-1200X-S-HPCVD
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Please email for lead time
Item Number: OTF1200XSHPCVD
Transported by LTL Freight (Truck)
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OTF-1200X-S-HPCVD is a compact 2" split tube furnace with internal sample traveling system inside the processing tube. This allows the position & temperature control of the sample stage or crucible via touch screen digital controller. It is designed for multi-functional rapid thermal processing, such as hybrid physical-chemical deposition(HPCVD), rapid thermal evaporation (RTE), and as well Horizontal Bridgman Crystal Growth ( HDC) under various atmosphere for new generation crystal research.
SPECIFICATIONS:
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Split Tube Furnace
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- 208 - 240 VAC, 50/60Hz, 1.2 KW max. power consumption
- Working temperature: 1100°C continuous and 1200°C Max.
- 2" quartz tube (50mm O.D x 44mm I.D x 450mm L) with vacuum-sealed flanges.
- Optional: you may choose dual-zone tube furnace at Pic below right at extra cost to create a higher thermal gradient or longer constant temperature zone
   -- two-zone furnace
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Temperature Control
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Vacuum Sealing
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- 2" quick clamp flange with 1/4'' fittings, vacuum gauge as well as needle valve on the right side
- The right flange is connected to a stainless steel bellow which is stretchable up to 150 mm.
- Left flange with quick-clamped KF25 vacuum port and 1/4'' barb venting valve
- Max. Vacuum level: 10E-2 torr by mechanical pump and 10-E5 by turbopump
 (click picture to see details )
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Internal Traveling Mechanism &
PLC Control Pannel
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- One 1/4" Dia. x 24'' long K-type thermal couple is inserted through the right flange to support a mini-crucible boat in the chamber. (click pic.1 to view)
- A step motor can drive the crucible inside the tube from the heating center to the right end of the furnace, 100 mm max.
- Touch screen control panel allows travel distance setting and temperature display of crucible position (click pic.2 to view)
- Traveling speed is constant at 180mm/ min. ( variable speed control is available upon request at additional cost )
- A 50x20x20mm mini-crucible boat (~20ml) is installed on a thermal couple (click pic.3 to view).
- AIN Sample Holder or Graphite Flat Substrate Holder for the wafer is available upon request, additional customization fee will apply (click pic.4 to view).
    
Pic.1 Pic.2 Pic.3 Pic.4 Pic.5
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Max. Heating & Cooling Rate
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The max heating and cooling rate can be achieved by moving sample into pre-heated hot zone and move the sample out from the hot zone. The typical ramp/cool rate is listed in below:
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Heating Rate:
10°C/sec (150°C - 250°C);
7°C/sec (250°C - 350°C);
4°C/sec (350°C - 500°C);
3°C/sec (500°C - 550°C);
2°C/sec (550°C - 650°C);
1°C/sec (650°C - 800°C);
0.5°C/sec (800°C - 1000°C);
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Cooling Rate:
10°C/sec (950°C - 900°C);
7°C/sec (900°C - 850°C);
4°C/sec (850°C - 750°C);
2°C/sec (750°C - 600°C);
1.5°C/sec (600°C - 500°C);
1°C/sec (500°C - 400°C);
0.5°C/sec (400°C - 300°C);
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Optional Parts
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- You may need a right angle valve & bellows to connect a vacuum pump ( click the 1st & 2nd pics to order )
- Anti-Corrosive digital Gauge up to 10E-5 torr is optional for CVD application (Pic 3)
- You may order multi-channel gas delivery system for DVD or CVD operation ( Pic 4)
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Dimensions
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 ( click Pic to see details )
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Warranty
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One year limited warranty with lifetime support (Consumable parts such as tubes and o-rings are not covered by the warranty) |
Laptop, software & WiFi Control(Optional)
 
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- Brand new laptop with Microsoft Windows 10 and Microsoft Office 2013 (30 days free trial) for immediate use.
- Labview Based Temperature Control System (EQ-MTS01) enables users to edit temperature profiles, manage heat-treatment recipe, record and plot data for MTI furnaces.
- A wireless remote control provides up to 300 meters of operating range.
- The above features are available upon request at an extra cost (up to $1,000). Please contact us for more information.
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Compliance
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- CE Certified
- NRTL or CSA certification is available upon request at extra cost.
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Warning
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- Tube furnaces with quartz tubes are designed for using under vacuum and low pressure < 0.2 bars / 3 psi
- Attention: A two-stage pressure regulator must be installed on the gas cylinder to limit the pressure to below 3 PSI for safe operation. Click here to learn the installation of a gas regulator.
- Vacuum limit definition for all quartz tube furnaces: * Vacuum pressures may only be safely used up to 1000°C
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| Operation Video and Instructions |
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| Application Notes |
This multi-functional furnace is suitable for the applications in below:
- RTE: Crucible loaded with evaporation material is placed in the center of the furnace, move sample holder to a downstream position with the appropriate temperature where the deposition takes place.
- HPCVD： Similar setup as RTE, we also introduce reactant gas to mix with evaporation vapor and make a deposition
- Horizontal Bridgman Crystal Growth： Load material and seed into a crucible and place it in the center of the furnace. Move the crucible at the desired speed to grow single crystal under suitable thermal gradient.
- If you have any question and suggestion, please contact us before purchasing
- After CVD, the graphene must be transferred from the metal catalyst to another substrate for most applications. By using the graphene transfer tape, the residue can be low
- For Horizontal directional crystalization (HDC), you may use a gas feedtrough as pic below：
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