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100 nm Silicon Nitride Film (PE-CVD) on Si(100)P-type ,B-doped 100 mm dia .x0.525mm thick, 1sp,R:0.001-0.005 ohm.cm - FmSi3N4onSiBa100D0525C1FT100


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Item Number: FmSi3N4onSiBa100D0525C1FT100

Silicon Nitride Film

  • Si3N4 Film coated by low stress PE-CVD method
  • Si3N4 Thickness:   100nm  +/- 8%
  • Si3N4 covers front polished side of Silicon wafer ONLY
  • Refractive Index of Si3N3: 1.98 +/-0.05 @ 632.8nm

Silicon Wafer Specifications:


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