Browse Categories

Silicon Nitride Film (LPCVD) on Corning 7980, Film thickness: 1.3um ,10x10x0.5mm

In stock
Item Number: FmSi3N4onCorning79801010FT1P3

Silicon Nitride Film

  • Si3N4 Film coated by low stress LPCVD method
  • Si3N4 Thickness:   1.3um  +/- 5%
  • Si3N4 covers both side on Corning 7980 0F fused silica  ( Warning: the Si3N4 film may have stressed induced micro-cracking resulted from the large difference of thermal expansion coefficient between Si3N4 and SiO2 fused silica )

• UV Grade Fused Silica (Corning 0F 7980 HPFS)
• Size: 10x10x0.5mm
• Edge: CNC Ground
• Surface Quality: 60/40 or beer
• Non-effective Area: 2.0 mm border
• TTV: < 20 microns
• Polishing: Two sides polished (60/40)
• Average Surface Roughness Ra: =< 5 A RMS

Related Products

Thin Films  A-Z

Crystal wafer A-Z

Plasma Cleaner

Wafer Containers

Dicing saw

Film Coater

Shopping Cart
Your cart is empty.
Please clear the browsing history before ordering the product. Otherwise, availability and price are not guaranteed.
Mailing Lists
MTI sponsorships:
MTI Sponsors Thermoelectrics Workshop

MTI-UCSD Battery Fabrication Lab

MTI Sponsors the Postdoctoral Awards

Upcoming Shows:

APS March Meeting 2023 March 5-10 Las Vegas NV Booth 534

TMS 2023 March 19 - 23 San Diego CA Booth 609

40th International Battery Seminar Exhibit March 20-23 2023 Orlando FL Booth 121

Recent Attended Shows:
AABC USA 2022 December 5 - 8 San Diego CA

2022 MRS Fall Meeting Nov 28 - Dec 2 Boston MA

Click here to see our past conferences

1. Prices listed online are valid for the US market and who pay by credit card only. There will be extra charges for shipping & handling. Prices vary from country to country.
2. We may add extra charges for paper orders and NET 30 terms due to extra labor costs.
3. The prices listed are subject to change without notice.