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DC/RF Dual-Head High Vacuum 2” Magnetron Plasma Sputtering Coater - VTC-600-2HD-LD

In stock
Item Number: VTC600HD2
Transported by LTL Freight (Truck)


VTC-600-2HD-LD is a compact magnetron sputtering system with dual 2" target sources, e.g., one DC source for coating metallic film, and the other RF source for coating non-metallic material. This coating system is designed for coating both single or multiple film layers for a wide range of materials, such as alloy, ferroelectric, semiconductor, ceramic, dielectric, optical, PTFE, etc. (Revised since 9/25/2015.  Film Thickness Monitor is not included.)


Compact Structure

Input Power
  • Single-phase 220 VAC 50 / 60 Hz
  • 2000 W (including a vacuum pump and water chiller)

Source Power

  • Two sputtering power sources are integrated into one control box (Click picture below to see detailed specs)
    • DC source: 500 W power for coating metallic materials (Pic 1)
    • RF source: 300 W power, 13.56 MHz frequency for coating non-conductive materials (Pic 2)
          -- Pic 1           -- Pic 2     

Magnetron Sputtering Head


Vacuum Chamber

  • Vacuum chamber: 300 mm Dia. x 300 mm Height, made of stainless steel
  • Viewport: Two pieces of 100 mm Dia. glass. One fixed; one detachable for cleaning and replacement
  • Hinged type lid with pneumatic power pole allows easy target change

Sample Stage

  • The sample holder is a rotatable and heatable stage made of the ceramic heater with copper cover
  • Sample holder size: 140 mm Dia. for. 4" wafer max
  • Rotation speed: 1 - 20 rpm adjustable for uniform coating
  • The holder temperature is adjustable from RT to 500 °C max (2 hr max) with accuracy +/- 1.0 °C via a digital temperature controller

Gas Flow Control

  • Two precision mass flow controllers (MFC) are installed to allow inlet of two types of gasses 
    • Flow rate: 0 – 200 mL/min adjustable on the touch screen control panel
  • Air inlet valve is installed for vacuum release
Vacuum Pump Station
  • A mobile pump station is included. The sputtering coater can be placed on top of the station
  • High-speed turbopump at speed 80L/S is combined with a two-stage mechanical pump (220 L/min) for max vacuum level and faster pumping speed
  • Standard vacuum level connected with chamber: < 4.0E-5 Torr.
  • Optional at extra cost
  • If choose a 150L/S high-speed turbopump, a vacuum can reach 10-6 torr  with a chamber  ( 6x10-7 torr with baking)
  • For the ultra-high vacuum up to 10^-7 torr, a getter pump (100L/s H2 & O2) is needed in addition to the turbopump. Please consult our engineers for detailed customization.
  •  150L/S high-speed turbopump          Getter Pump
Water Chiller
  • One digital temperature-controlled recirculating water chiller is included. (Click picture to see details)
    • Refrigeration range: 5~35 °C
    • Flow rate: 16 L/min
    • Pump pressure: 14 psi
    • Precise quartz Film Thickness Monitor is optional, which can be into the chamber to monitor coating thickness with an accuracy of 0.10 Å
    • Precision Thin Film & Coating Analysis Systems - EQ-TFMS-LD is available at extra cost
    • Various 2” oxide and metallic targets are available upon request at extra cost. Silver epoxy and copper backing plates can be ordered at MTI

    Overall Dimensions

              Lid closed: 48" × 28" × 32"                              Lid open: 48" × 28" × 37"

    Net Weight of Coater

    • 160 kg

    Shipping Weight & Dimensions

    • Total 2 Pallets
      • #1: 520 lbs, 52" x 40" x 50"
      • #2: 420 lbs, 48" x 40" x 45"


    • CE approval
    • NRTL Certification (UL 1450) is available upon request at extra cost


    • One year limited warranty with lifetime support

    Operation Demo Video


     Application Notes

        Pic 1    

            Pic 2              

    • A two-stage pressure regulator should be installed on the gas tank to limit the output pressure below 0.02 MPa.
    • In order to remove oxygen from the chamber, MTI suggest you to use 5% Hydrogen + 95 % Nitrogen to clean the chamber 2-3 times, which can reduce the oxygen level to < 10 ppm
    • Please use > 5N purity Argon gas for plasma sputtering. Even though 5N purity Ar usually contains 10 - 100 ppm oxygen and H2O depending on the supplier. MTI suggests you use a gas purification device to purify gas before filling in. (Click Pic #1 & #2 on the left to order)
    • For best performance, the non-conductive targets must be installed with a copper backing plate. Please refer to the instruction video below for target bonding (Click Pic #3 below)
    • MTI supplies single crystal substrate from A to Z (Click Pic #4 below to order) 
    • MTI Sputtering Coaters have successfully coated ZnO on Al2O3 substrate at 500 °C (XRD profile in Pic #5 below)
    • HIGH VOLTAGE! Sputtering heads connect to high voltage. For safety, the operator must shut down the RF / DC generator before sample loading and target changing operations
    • DO NOT use tap water in a water chiller. Use coolant, DI water, distilled water, or anti-corrosive additives with water
    • The coater can be placed into glovebox as the Pic. 6 at extra cost ( must order glovebox together)
    •  Pic 3  Pic 4  Pic 5 Pic. 6

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    1. Prices listed online are valid for US market and whom pay by credit card only. There will be extra charges for shipping & handling. Price various from country to country.
    2. We may add extra charges for paper order and net30 terms due to extra labor cost.
    3. The prices listed are subject to change without notice.