DC/RF Dual-Head High Vacuum 2” Magnetron Plasma Sputtering Coater - VTC-600-2HD-LD

• Single-phase 220 VAC 50 / 60 Hz
• 2000 W (including a vacuum pump and water chiller)

• Two sputtering power sources are integrated into one control box (Click the picture below to see detailed specs)
• DC source: 500 W power for coating metallic materials (Pic 1)
• RF source: 300 W power, 13.56 MHz frequency for coating non-conductive materials (Pic 2)

          -- Pic 1           -- Pic 2     

Magnetron Sputtering Head

• Two 2" Magnetron Sputtering Heads with water cooling jackets and shutters are included (Click Pic. 1)
• One is connected to a DC source for coating metallic materials
• The other one is connected to the RF source for non-conductive materials
• Target size requirement:  2" diameter with a thickness of  0.1 - 5 mm
• One Stainless Steel Target target and one Research Grade Al2O3 target are included for demo testing
• Recommended Sputtering Recipe and Useful Tips
• Customized coater:
• Two DC heads without RF; two RF heads without DC; 3 RF heads are available upon request
• Optional: 148 cm RF cable can be ordered at extra cost for the replacement (Click the pic below to order)
• Four heads sputtering system is available upon request  (Pic. 5)

          Pic. 1   

  Pic. 2   Pic. 3        Pic. 4    Pic. 5

Vacuum Chamber

• Vacuum chamber: 300 mm Dia. x 300 mm Height, made of stainless steel
• Viewport: Two pieces of 100 mm Dia. glass. One fixed; one detachable for cleaning and replacement
• Hinged type lid with pneumatic power pole allows easy target change

Sample Stage

• The sample holder is a rotatable and heatable stage made of the ceramic heater with copper cover
• Sample holder size: 140 mm Dia. for. 4" wafer max
• Rotation speed: 1 - 20 rpm adjustable for uniform coating
• The holder temperature is adjustable from RT to 500 °C max (2 hr max) with accuracy +/- 1.0 °C via a digital temperature controller

Gas Flow Control

• Two precision mass flow controllers (MFC) are installed to allow inlet of two types of gasses 
• Flow rate: 0 – 200 mL/min adjustable on the touch screen control panel
• Air inlet valve is installed for vacuum release

• A mobile pump station with a rotary vane pump is included. The sputtering coater can be placed on top of the station
• For vacuum <4E-5 Torr, a 63 L/s turbomolecular pump is optional. 
• For vacuum <1E-5 Torr, a 260 L/s turbomolecular pump is optional.
• High vacuum condition is required for targets sensitive to oxygen, such as Al, Ti, Cr, etc. 
•        

• One digital temperature-controlled recirculating water chiller is included.
• Refrigeration range: 5~35 °C
• Flow rate: 16 L/min
• Pump pressure: 14 psi

• Precise quartz Film Thickness Monitor is optional, which is used for in-situ thickness measurement. Accuracy up to 1Å
• Precision Thin Film & Coating Analysis Systems - EQ-TFMS-LD is available at an extra cost
• Various 2” oxide and metallic targets are available upon request at extra cost. Silver epoxy and copper backing plates can be ordered at MTI

Overall Dimensions

          Lid closed: 48" × 28" × 32"                              Lid open: 48" × 28" × 37"

Net Weight of Coater

• 160 kg

Shipping Weight & Dimensions

• Total 2 Pallets
• #1: 520 lbs, 52" x 40" x 50"
• #2: 420 lbs, 48" x 40" x 45"

Compliance

• CE approval
• NRTL Certification (UL 1450) is available upon request at extra cost

Warranty

• One-year limited warranty with lifetime support

Operation Demo Video

 Application Notes

            

• A two-stage pressure regulator should be installed on the gas tank to limit the output pressure below 0.02 MPa.
  
• Please use > 5N purity Argon gas for plasma sputtering. 
• For best performance, the non-conductive targets must be installed with a copper backing plate. Please refer to the instruction video below for target bonding (Click Pic #3 below)
• MTI supplies single crystal substrate from A to Z (Click Pic #4 below to order) 
• MTI Sputtering Coaters have successfully coated ZnO on Al₂O₃ substrate at 500 °C (XRD profile in Pic #5 below)
• HIGH VOLTAGE! Sputtering heads connect to high voltage. For safety, the operator must shut down the RF / DC generator before sample loading and target changing operations
• DO NOT use DI water in a water chiller. Use coolant, distilled water, or anti-corrosive additives with water
• The coater can be placed into glovebox as the Pic. 6 at extra cost ( must order glovebox together)

• Pic 3

  Pic 4

  Pic 5

  Pic. 6