Browse Categories

DC/RF Dual-Head High Vacuum 2” Magnetron Plasma Sputtering Coater - VTC-600-2HD-LD

In stock
Item Number: VTC600HD2
Transported by LTL Freight (Truck)

VTC-600-2HD-LD is a compact magnetron sputtering system with dual 2" target sources, e.g., one DC source for coating metallic film, and the other RF source for coating non-metallic material. This coating system is designed for coating both single or multiple film layers for a wide range of materials, such as alloy, ferroelectric, semiconductor, ceramic, dielectric, optical, PTFE, etc. (Revised since 9/25/2015.  Film Thickness Monitor is not included.)


Compact Structure

Input Power
  • Single-phase 220 VAC 50 / 60 Hz
  • 2000 W (including a vacuum pump and water chiller)

Source Power

  • Two sputtering power sources are integrated into one control box (Click the picture below to see detailed specs)
    • DC source: 500 W power for coating metallic materials (Pic 1)
    • RF source: 300 W power, 13.56 MHz frequency for coating non-conductive materials (Pic 2)
          -- Pic 1           -- Pic 2     

Magnetron Sputtering Head

  • Two 2" Magnetron Sputtering Heads with water cooling jackets and shutters are included (Click Pic. 1)
  • Customized coater:
  • Two DC heads without RF; two RF heads without DC; 3 RF heads are available upon request
  • Optional: 148 cm RF cable can be ordered at extra cost for the replacement (Click the pic below to order)
  • Four heads sputtering system is available upon request  (Pic. 5)
          Pic. 1     Pic. 2   Pic. 3        Pic. 4    Pic. 5

Vacuum Chamber

  • Vacuum chamber: 300 mm Dia. x 300 mm Height, made of stainless steel
  • Viewport: Two pieces of 100 mm Dia. glass. One fixed; one detachable for cleaning and replacement
  • Hinged type lid with pneumatic power pole allows easy target change

Sample Stage

  • The sample holder is a rotatable and heatable stage made of the ceramic heater with copper cover
  • Sample holder size: 140 mm Dia. for. 4" wafer max
  • Rotation speed: 1 - 20 rpm adjustable for uniform coating
  • The holder temperature is adjustable from RT to 500 °C max (2 hr max) with accuracy +/- 1.0 °C via a digital temperature controller

Gas Flow Control

  • Two precision mass flow controllers (MFC) are installed to allow inlet of two types of gasses 
    • Flow rate: 0 – 200 mL/min adjustable on the touch screen control panel
  • Air inlet valve is installed for vacuum release
Vacuum Pump Station
  • A mobile pump station with a rotary vane pump is included. The sputtering coater can be placed on top of the station
  • For vacuum <4E-5 Torr, a 63 L/s turbomolecular pump is optional. 
  • For vacuum <1E-5 Torr, a 260 L/s turbomolecular pump is optional.
  • High vacuum condition is required for targets sensitive to oxygen, such as Al, Ti, Cr, etc. 
Water Chiller
  • One digital temperature-controlled recirculating water chiller is included.
    • Refrigeration range: 5~35 °C
    • Flow rate: 16 L/min
    • Pump pressure: 14 psi
    Film Thickness Monitor 
    (Option )
    • Precise quartz Film Thickness Monitor is optional, which is used for in-situ thickness measurement. Accuracy up to 1Å
    • Precision Thin Film & Coating Analysis Systems - EQ-TFMS-LD is available at an extra cost
    • Various 2” oxide and metallic targets are available upon request at extra cost. Silver epoxy and copper backing plates can be ordered at MTI

    Overall Dimensions

              Lid closed: 48" × 28" × 32"                              Lid open: 48" × 28" × 37"

    Net Weight of Coater

    • 160 kg

    Shipping Weight & Dimensions

    • Total 2 Pallets
      • #1: 520 lbs, 52" x 40" x 50"
      • #2: 420 lbs, 48" x 40" x 45"


    • CE approval
    • NRTL Certification (UL 1450) is available upon request at extra cost


    • One-year limited warranty with lifetime support

    Operation Demo Video


     Application Notes


    • A two-stage pressure regulator should be installed on the gas tank to limit the output pressure below 0.02 MPa.
    • Please use > 5N purity Argon gas for plasma sputtering. 
    • For best performance, the non-conductive targets must be installed with a copper backing plate. Please refer to the instruction video below for target bonding (Click Pic #3 below)
    • MTI supplies single crystal substrate from A to Z (Click Pic #4 below to order) 
    • MTI Sputtering Coaters have successfully coated ZnO on Al2O3 substrate at 500 °C (XRD profile in Pic #5 below)
    • HIGH VOLTAGE! Sputtering heads connect to high voltage. For safety, the operator must shut down the RF / DC generator before sample loading and target changing operations
    • DO NOT use DI water in a water chiller. Use coolant, distilled water, or anti-corrosive additives with water
    • The coater can be placed into glovebox as the Pic. 6 at extra cost ( must order glovebox together)
    •  Pic 3  Pic 4  Pic 5 Pic. 6

    Related Products

    Shopping Cart
    Your cart is empty.
    Please clear the browsing history before ordering the product. Otherwise, availability and price are not guaranteed.
    Mailing Lists
    MTI sponsorships:
    MTI Sponsors Thermoelectrics Workshop

    MTI-UCSD Battery Fabrication Lab

    MTI Sponsors the Postdoctoral Awards

    Upcoming Shows:

    Solid-State Battery Summit August 13-15 Chicago IL Booth 36

    PRiME 2024 October 6-11 Honolulu HI Booth 227

    2024 MRS Fall Meeting December 1-6 Boston MA Booth 901

    AABC US December 9-12 Las Vegas NV

    Click here to see our past conferences

    1. Prices listed online are valid for the US market and who pay by credit card only. There will be extra charges for shipping & handling. Prices vary from country to country.
    2. We may add extra charges for paper orders and NET 30 terms due to extra labor costs.
    3. The prices listed are subject to change without notice.