Plasma Sputtering Coater with Three Sputtering Sources and RF/DC Power Supplies - VTC-600-3HD-LD

• Single-phase 220 VAC 50 / 60 Hz
• 2000 W (including a vacuum pump and water chiller)

• Three sputtering power sources are integrated into one control box (Click picture below to see detailed specs)
• DC source: 500 W power for coating metallic materials (Pic 1)
• RF source: 300 W power, 13.56 MHz frequency for coating non-conductive materials (Pic 2)

          -- Pic 1           -- Pic 2     

Magnetron Sputtering Head

• Three 2" Magnetron Sputtering Heads with water cooling jackets and shutters are included (Click 1st pic from left)
• Target size requirement: 2" diameter
• Thickness range: 0.1 - 5 mm for both metallic and non-conductive targets (including the backing plate)
• One Stainless Steel Target and one Research Grade Al2O3 target are included for demo testing
• Optional 2" sputtering targets (or backing plate) are available upon request at extra cost.
• Recommended Sputtering Recipe and Useful Tips
• Customized coater: Two DC - One RF; Two RF - One DC; Three DC; Three RF (Please select from Product Options)
• Optional: 148 cm RF cable can be ordered at extra cost for replacement (Click the 1st pic from right to order)

             

    

Vacuum Chamber

• Vacuum chamber: 300 mm Dia. x 300 mm Height, made of stainless steel
• Viewport: Two pieces of 100 mm Dia. glass. One fixed; one detachable for cleaning and replacement
• Hinged type lid with pneumatic power pole allows easy target change

Sample Stage

• The sample holder is a rotatable and heatable stage made of the ceramic heater with copper cover
• Sample holder size: 140 mm Dia. for. 4" wafer max
• Rotation speed: 1 - 20 rpm adjustable for uniform coating
• The holder temperature is adjustable from RT to 500 °C max (2 hr max) with accuracy +/- 1.0 °C via a digital temperature controller

Gas Flow Control

• Two precision mass flow controllers (MFC) are installed to allow inlet of two types of gases
  
• Flow rate: 0 – 200 mL/min & 0 - 100ml/min adjustable on the touch screen control panel
• Air inlet valve is installed for vacuum release

• A mobile pump station is included. The sputtering coater can be placed on top of the station
• High-speed turbopump at speed 80L/S is combined with a two-stage mechanical pump (220 L/min) for max vacuum level and faster pumping speed
• Standard vacuum level connected with chamber: < 4.0E-5 Torr.
• Optional at extra cost
• If choose a 150L/S high-speed turbopump, the vacuum can reach 10-6 torr with the chamber 。 
• For the ultra-high vacuum up to 10^-7 torr, 700S/L turbopump is needed 
•  150L/S high-speed turbopump        700L/S high-speed turbopump  

• One digital temperature-controlled recirculating water chiller is included. (Click picture to see details)
• Refrigeration range: 5~35 °C
• Flow rate: 16 L/min
• Pump pressure: 14 psi

• Precise quartz Film Thickness Monitor is optional, which can be into the chamber to monitor coating thickness with an accuracy of 0.10 Å
• Precision Thin Film & Coating Analysis Systems - EQ-TFMS-LD is available at extra cost
• Various 2” oxide and metallic targets are available upon request at extra cost. Silver epoxy and copper backing plates can be ordered at MTI

             

Overall Dimensions

                                        
          Lid closed: 48" × 28" × 32"         Lid open: 48" × 28" × 37"

Net Weight of Coater

• 160 kg

Shipping Weight & Dimensions

• Total 3 Pallets
• 365 lbs, 48" x 40" x 45"
  
• 390 lbs, 48"x 40" x 49"
  
• 210 lbs, 48" x 40"x 30"
  

Compliance

• CE approval
• NRTLcertification is available upon request at extra cost, please contact our sales representative for the quote.

Warranty

• One year's limited warranty with lifetime support

Operation Instruction

Application Note