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Cu Film on Ta/Silicon Wafer, 10 mm x 5 mm, 100 nm Thick,

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Item Number: Cu-Ta-Si-1005


  • Cu coated Si Wafer ( 10x5 mm size )
  • Thickness of highly oriented polycrystalline Cu <111> film: 100 nm
  • Thickness of Ta diffusion barrier: 20-50 nm
  • 10x10 x 0.5 mm thickness Si wafer (Prime Grade)
  • P type, B doped, <100> orientation, SSP
  • Resistivities: 1-20 ohm-cm
  • Surface Roughness:   as grown ,  RA < 10 nm
  • Package: One 1000 class clean room with 100 class plastic bag
  • 10 pcs per package for minimum order

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