MTI Corp - Leading provider of lab equipments and advanced crystal substrates - CVD Equipment for Graphene & 2D Materials

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The material research community exploring 2D materials beyond graphene is rapidly expanding. Encouraging work has already been intensively reported from different material systems such as nitrides (e.g., h-BN), dichalcogenides (e.g., MoS₂), topological insulators (e.g., Bi₂Se₃ or Bi₂Te₃) and even oxides. MTI is supplying CVD equipment for graphene and 2D material. Please click thumb picture below to find our standard CVD system. If you have any customized requirement , please let us know. We may use existing modules to build a system for you immediately

Graphene Layer Growth	Atmosphere Controlled RTP Slidable RTP for Fast Cooling Dual Furnace Sliding PECVD furnaces
2D Material Growth by CVD	CVD for 2D Crystals Two Zone Hydrogen Tube Furnace Slidable PECVD Furnace Large-Area Graphene Growth
2D Material Growth by Sputtering	1" RF Plasma Sputtering coating DC/RF Dual-Head 2” Sputtering WSe2 Target
Related Substrate	Thermal Oxide Wafer Single Crystal Copper Crystal Substrate A-Z
Related Products	Copper / Nickel Foil for Graphene Growth (150m length x 150mm width x 25um thickness) - EQ-bccf-25u, please click pic.1 for details. After CVD, the graphene must be transferred from the metal catalyst to another substrate for most applications. By using the graphene transfer tape, the residue can be low. Please click pic.3 for details. You may order a Compact Liquid Vaporization Systems for better CVD, click pic.4 for details.
Reference Articles or video	Grains and grain boundaries in single-layer graphene atomic patchwork quilt published by NATURE 09718, Jan 5, 2011, in which an MTI RTP furnace was used. Lateral heterojunctions within monolayer semiconductors, Chueming Huang etl, at Nature Materials 3D Graphene Growth on Nickel Foam, please click here to read.

Displaying products 1 - 4 of 4 results	Show:	Sort:

Three Zone Quartz Tube Furnace (80mm Dia, 1200C Max) with 3 Channel Gas Mixer, Vacuum Pump, & Anti-Corrosive Vacuum Gauge - OTF-1200X-III-80-F3LV Sale Price: Call or email for pricing	1200°C Tube Furnace with Internal Travel Mechanism For HPCVD - OTF-1200X-S-HPCVD Sale Price: RFQ	Roll to Roll PE-CVD System for Continuous Graphene or Two Dimensional Film Growth - OTF-1200X-II-PE-RR Sale Price: RFQ
1600°C Horizontal Flash Sintering Furnace with 3KW Programmable Power Source -GSL-1600X-FS3KW Sale Price: RFQ


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1. Prices listed online are valid for US market and whom pay by credit card only. There will be extra charges for shipping & handling. Price various from country to country.
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Three Zone Quartz Tube Furnace (80mm Dia, 1200C Max) with 3 Channel Gas Mixer, Vacuum Pump, & Anti-Corrosive Vacuum Gauge - OTF-1200X-III-80-F3LV

1200°C Tube Furnace with Internal Travel Mechanism For HPCVD - OTF-1200X-S-HPCVD

Roll to Roll PE-CVD System for Continuous Graphene or Two Dimensional Film Growth - OTF-1200X-II-PE-RR

1600°C Horizontal Flash Sintering Furnace with 3KW Programmable Power Source -GSL-1600X-FS3KW