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YAlO3 is excellent substrate for HTS film and II-V nitride , as well as many oxide films due to its chemcial stability and lattice matching.

Structure

Lattice (A)

Melting Point

Density g/cc

Dielectric Constant

Thermo-Expans x10-6/K

Max. Xtl  Size

Orthor.

a=5.3286(4) b=7.3706(5)  c=5.1796(3)

1870 0C

4.88

16-20

2-10

30d x 50mm

XRD diffraction angle:  20°54' <110> and  (41°44') <220>






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